Bene Technology Co.,Ltd.
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Á¦¸ñ ¼¼¹Ì³ª µî·Ï Çϼ¼¿ä..:2017 USP/PIC/S /EP Validation Guidelines on Dissolution, Chromatograph, ICP/Mass/Mass
ÀÛ¼ºÀÏÀÚ 2017-04-07

2017 USP/PIC/S /EP Validation Guidelines on Dissolution,

 

/Chromatograph,/ ICP/Mass/Mass



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* ¼¼¹Ì³ªÀϽà : 2017³â 5¿ù10ÀÏ (¼ö¿äÀÏ) ¿ÀÈÄ 2½Ã~5½Ã


 

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* ¼¼¹Ì³ª³»¿ë : º°Ã· ÂüÁ¶


 


 

* °­»ç: ¾ç½ÂÁøÂ÷Àå(WA Korea»ç MKT Manager


 

         Çã¼ø¿µ(PE Korea  Director)


 

            UNIFLEX»ç: Japan Arkari Hatorry  General Manager


 



* ´ë»ó :±¹Á¦ ºÐ¼®ÀåºñµéÀÇ Software /Hardware Data Integrity  ¼¼°ÔÁöħ ¿øÈ°ÇÑ Àû¿ë°ú Data


 

         È¿À²ÀûÀÎ °ü¸® À§ÇÏ¿©  ºñ±³¿ëÃâ±â ¹× Å©·Î¸¶Åä±×·¡ÇÁ,ICP/MASS °ü·Ã ºÐµéÀº µî·Ï


 


 


 

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AGENDA

 

 


        13 : 00 ~ 13 :1 0 Greetings and Introduction

 

13 : 10 ~ 13 : 50 Data integrity for Chromatograph

 

13 : 50 ~ 14 : 10 Coffee Break

 

14 : 10 ~ 14 : 50 PIC/S,USP Validation for ICP/MASS

 

14: 50 ~ 15 : 10 Coffee Break

 

15 : 10 ~ 15 : 50 PIC/S,USP Validation for Dissolution test

 

15 : 50 ~ 16 : 40 On site Demo( InPlace Clean Washer )

 

16 : 40 ~ 16 : 50 Guidelines of Dissolution Test , Q & A


 



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